An off-line experiment was performed to estimate a model for on-line process control which describes the empirical relationship between the design and production factors affecting the front wheel ...

Shrinking technology nodes and smaller process margins require improved photolithography overlay control. Generally, overlay measurement results are modeled with Cartesian polynomial functions for ...

Aspen Technology's Elinor Price describes how advanced process control modeling and simulation can become part of the modern control room. An upcoming feature article in January, "Changing Workforce ...

A new process control method uses a special mathematical structure to accurately estimate the internal process variables of a system, even when external sensors are damaged. Be it nuclear power plants ...

While dynamic modeling is arguably one of the most important technological developments for engineers in the last 50 years, many process control engineers are unable to use it. It requires proper time ...

Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay ...

CHEYENNE -- W. Edwards Deming was a quality control guru who revolutionized the Japanese auto industry after World War II and later used his same management model for the U.S. auto industry. He was ...